Tous les équipements.
Simple High-Atomization Spray Gun System
SED-1.5PYXT-M is a simple high-atomization spray gun system for pharmaceutical pilot lines and research institutes, used for film-coating tablets and pellets,…
La description complète du modèle est encore en anglais
- Simple, low-cost spray system suitable for R&D and small batches
- Wide spray-rate range (0–60 to 0–600 ml/min) by nozzle swap
- Easy field calibration of liquid flow and pattern width
Coating Spray System
SED-12PYXT-D coating spray system: auxiliary unit for tablet/pill/granule coating pans.
La description complète du modèle est encore en anglais
- Eliminates uneven manual spraying; reduces labor
- Silicone-tube-only wetted path — GMP-compliant
- Reverse-pump cleaning supported (residual coating blow-back to drain)
Coating Spray System
SED-12PYXT-M coating spray system: auxiliary spray unit for pharmaceutical coating-pan lines.
La description complète du modèle est encore en anglais
- Replaces uneven manual spray with consistent atomization
- Pharmaceutical-grade silicone-only wetted path (GMP)
- Compact and mobile — rolls between coating pans
SED-30PYXT-M Coating Solution Spray System
SED-30PYXT-M coating-solution spray system: an auxiliary unit that supplies highly atomised coating liquid to a tablet/pill/granule coater.
La description complète du modèle est encore en anglais
- Drop-in retrofit auxiliary for existing pan coaters
- Better atomisation and coating uniformity than coater built-in spray systems
- GMP-compliant sanitary silicone tubing
SED-50PYXT-M
The SED-50PYXT-M is a coating-spray auxiliary system that supplies finely atomized coating liquid to a tablet, pellet, or granule coating machine.
La description complète du modèle est encore en anglais
- Drop-in companion to coating pans / fluid-bed coaters: maintains coating liquid at correct temperature and atomization through long runs
- GMP-compliant sanitary silicone hose and stainless tank suit pharma audits
- Independent adjustment of stir speed, flow rate, and spray width gives operators broad process latitude