SED-9ZKDM-A — Multi-Arc Ion Plating Vacuum Coating Machine

1) Evacuation: Three Taiyueheng FF250/1600 turbomolecular pumps + Zhuojie hydraulic-coupling 300 Roots pump + three Zhuojie RVP-25 mechanical pumps draw the chamber to 5×10⁻⁴ Pa via GDQ-250 three-in-one valve and motorised louvre gate valve (side-mounted, 0-90°). 2) Baking: 36 kW disc heater raises substrate temperature to process temperature (RT – 500 °C, SCR intelligent control ±8 °C). 3) Gas distribution: Burkert MFC flowmeters precisely control N₂ (2000 sccm), Ar (1000 sccm), C₂H₂ (500 sccm), O₂ (500 sccm) with upstream solenoid valves, mixing tank, and dual-layer microporous zone distribution. 4) Coating: Nine Φ160 arc sources (electromagnetic coils + multi-field configuration, high ionisation rate) + two IET large arc sources on the door strike Ti targets; arc power supply 250 A / 25 V. HÜTTINGER DC4020 bias supply applies substrate bias. 5) Uniform deposition: turntable at 1-5 rpm public revolution + 12 self-rotating shafts; independent water cooling on each subsystem with low-water alarms; Schneider contactors/relays in control cabinet.